TECHNIC France

TechniStrip P1331 - 5.00 l - MOS

TechniStrip® P1331 is, for alkaline sensitive materials, an alternative to the P1316.
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Product number: TP1331M
Manufacturer: TECHNIC France
Product information "TechniStrip P1331 - 5.00 l - MOS"

TechniStrip® P1331

High Performance Remover

 

General Information

TechniStrip® P1331 is a remover with very strong stripping power for Novolak-based resists (including all AZ® positive resists), epoxy-based coatings, polyimides and dry films. At a typical application temperatures around 75°C TechniStrip® P1331 may dissolve cross-linked resists without residue also, e.g. through dry etching or ion implantation. The remover can also be used in spraying processes.
TechniStrip® P1331 is, for alkaline sensitive materials, an alternative to the P1316.

Product Properties
  • Flashpoint: 100,5°C
  • Viscosity (20°C): < 2 cP
  • Water Solubility: Totally miscible
  • Boiling point: 189°C
  • Density (at 20°C): 1.109 g/cm3
Compatibility
  • Metals: attacked Al, Cu, Au
  • Metals: no attack on Ta, Ni, Ti, TiN
  • Substrates: Si, SiO2

Data on selectivity and compatibility are manufacturer information and do not claim to be complete. Please contact us for further details.

Main Features
  • Very high stripping rate, >10µm/min
  • Great resin dissolution efficiency
  • Enhanced resin loading capacity, > 2 times to standard POR
    • THB121N, 21µm, 8” wafer- up to 15 wafers/liter
  • Bath life up to 72 hours @ 70°C
  • Total metal compatibility, <10A/min @60°C
  • Complete water miscibility
  • Safety: labeled irritant
Some Applications

TechniStrip® P1316 is a powerful NMP-free remover for:

  • Novolak-based positive resists such as all positive AZ® resists
  • Epoxy-based resists
  • Polyimides, bonding glues
  • Dry films
Further Information

MSDS:
Safety Data Sheet TechniStrip P1331 (MOS) english
Sicherheitsdatenblatt TechniStrip P1331 (MOS) german

TDS:
Technical Data Sheet TechniStrip P1331 (MOS) english

Specs:
Specs TechniStrip P1331 (MOS)

Application Notes:
Photoresist Removal english
Fotolack entfernen german

Further Information about Processing

Bottle size: 5.00 l
Compatible Substrates: Si, SiO2
Purity: MOS
Selectivity (attacked): Al, Au, Cu
Selectivity (no attack on): Ni, Ta, Ti, TiN