Since 2001 we supply a growing number of research institutes, start-ups and production facilities in the field of micro-structuring with photo resists, ancillaries, solvents, and etchants in semiconductor quality.
Beside our continuously growing product range, it's our utmost concern to assist you with related technical support, short lead times, and suited sales units.
Do you have any technical questions concerning your litho processes, or our products? Please do not hesitate to contact us!
Your Team MicroChemicals
! AZ 5214E phase out !
The manufacturer Merck informed us, that the photoresist AZ 5214E will be phased out until end of 2021 (official statemant). We also have been informed, that a similar (but not identical) product is already on the market: The Japanese version of the AZ 5214E.
In order to assist you for qualification of the Japanese AZ 5214E, we will be able to provide samples of this resist in near future (probably February/March 2021) as well as technical support in process parameter optimization.
Please feel free to contact us!
The following two documents detail the comparison studies of the "old" and Japanese AZ 5214E in both, positive and negative mode:
! PRODUCTION STOP OF NMP !
For some years now, NMP has been classified as toxic to reproduction and the use of NMP has become more and more restricted. Now the EU has continued to restrict the use of NMP, so that after 09.05.2020, NMP can only be used if special precautions are taken.
Technic France, our current single supplier for NMP, has now decided to completely stop the production of the NMP.
We have many products in our portfolio that can replace NMP and many customers have already qualified alternatives in the past due to the increasingly problematic situation regarding NMP. DMSO, TechniStrip D350, NI555, P1316, P1331, MLO-07, Micro D2, AZ 100 Remover or the strippers from Intelligent-Fluids SH5 and SVD can be considered as alternative products.
We would be happy to supply you with samples of possible alternatives; it is best to briefly describe the process and the (substrate) materials involved so that we can explore the best alternatives together with you.
AZ Remover 920 - Organic Solvent based Remover
AZ® Remover 920 photoresist stripper is designed for fast delamination and dissolution of photoresist patterns while maintaining broad compatibility with device substrates and metal films. Merck’s proprietary solvent and additive blend is environmentally friendly and fully compliant with the European Union’s REACH regulatory code.
! AZ MIR 701 product change !
The manufacturer of the resist AZ 701 MIR (14 and 29 cPs) informed us on a scheduled product change notification concerning a PFOA related ingredient (PCN).
As the qualification document (each one for both viscosities) shows, the PFOA-free AZ 701 MIR does not reveal significant changes compared to the PFOA-containing AZ 701 MIR.
If you would like to test or qualify the PFOA-free AZ 701 MIR, we will be able to provide samples.
Please feel free to contact us!
DMSO from MicroChemicals
In addition to our solvents acetone and isopropyl alcohol, we are now offering our new MicroChemicals DMSO in ULSI quality. The solvent and stripper is available in 2.5 L containers and can be ordered as single bottles or in the packaging unit of 4 x 2.5 L.
Due to its low vapor pressure and its water solubility, DMSO is an excellent stripper for resists respectively Lift-off media and is a non-toxic substitute for the NMP, which has been classified as toxic since a while. The optional addition of cyclopentanone or MEK increases the performance of the stripper for certain
applications and significantly lowers the melting point of pure DMSO.
If you are interested in a sample of our DMSO, please let us know.
OUR WAFER ONLINE SHOP
! IMPORTANT NOTE REGARDING AZ 826 MIF DEVELOPER !
Recently we were informed by the manufacturer Merck, whose distributor we are, about changes of the product AZ 826 MIF Developer.
Futher information you can find in the documents below:
Our new Strippers
Photoresist Stripper SVD and SH5
The strippers easily removes layers of photoresists (PR) from inorganic substrates such as silicon, glass and metals (e.g. copper). The smart intelligent fluids® (IF) mode of action is not based on aggressive dissolving processes as in the case of many conventional products. Instead, intelligent fluids® enable a gentle physical detaching even of persistent layers, without damaging the substrate surface.
Technical Data Sheet:
Acetone and Isopropyl Alcohol from MicroChemicals
We are now offering our new MicroChemicals Acetone and Isopropyl Alcohol in ULSI quality. Our solvents are available in 2.5 L containers and can be ordered as single bottles or in the packaging unit of 4 x 2.5 L. Both products are ideal for substrate cleaning for organic contaminants and particles.
New: Technical Guideline
Application Areas and Compatibilities of our Photoresists, Developers and Removers
With the information collected in this document, we would like to give you an initial overview of the basic areas of application and compatibility of our
Easily find the right developer, stripper and remover for your photoresist with our guideline.
We would be happy to advise you in more detail personally!
Our Book Photolithography 2020
The last few months we have been working on a new edition of our brochures. We have compiled all themes about photolithography in one softcover book. All contents and information of the previous edition have been revised, updated and renewed.
If you are interested in our book Photolithography - Basics of Microstructuring, please fill in the order form:
Semicon 2019 in Munich
We say thanks to all customers, partners and prospects who have visited us at Semicon and Productronica 2019 in Munich at our booth. It was a very successful show with important and interesting encounters for us.
Photolithographie - Basics of Microstructuring
(not available as PDF)