Welcome

Since 2001 we supply a growing number of research institutes, start-ups and production facilities in the field of micro-structuring with photo resists, ancillaries, solvents, and etchants in semiconductor quality.

Beside our continuously growing product range, it's our utmost concern to assist you with related technical support, short lead times, and suited sales units.

Do you have any technical questions concerning your litho processes, or our products? Please do not hesitate to contact us!

Your Team MicroChemicals

! IMPORTANT NOTE REGARDING AZ 826 MIF DEVELOPER !

Recently we were informed by the manufacturer Merck, whose distributor we are, about changes of the product AZ 826 MIF Developer.

STEP 1: We had already informed you of the first change at the beginning of 2019 with the letters "AZ 800 MIF Developers PCN Letter". This change affected a surfactant (which is an additive), of which the production has been stopped by a raw material supplier.
Fortunately, Merck was able to obtain the exact same substance from another raw material supplier, so that this change did not have a negative impact on any of our customers' tests "AZ 800 MIF Developer techn. Daten".

Now we would like to inform you that this change has been implemented since January, so that the "old" material will only be sold and then the transition to the new material will take place.
If you are interested in a sample, please feel free to contact us.

STEP 2: The European Union has listed a substance in Annex XIV REACH that may no longer be used from January 2021. The AZ 826 MIF Developer contains this substance as an additive. A task force at Merck has worked on an alternative and has now found a comparable additive and presented a process-technically equivalent successor for the AZ 826 MIF Developer: the AZ 2026 MIF Developer. We have also provided you the official product change notification "AZ 826 MIF Developer PCN Letter" together with a comparative study of the AZ 826 MIF with the AZ 2026 MIF "AZ AZ 2026 MIF vs. AZ 826 MIF".

From March 2020, samples of the new AZ 2026 MIF will be available, which we can then provide in sufficient quantities for your tests.
Please let us know how much you will need for your tests and any qualifications so that we can arrange the material for you accordingly. Of course, we assure you of our full support for any problems with the changeover, but we assume that in most applications this change will go unnoticed.

Thank you for understanding!

We will gladly send you samples on request.
Please contact us: sales(at)microchemicals.de

Thank you for understanding!

Step 1:

> AZ 800 MIF Developers PCN Letter
> AZ 800 MIF Developer techn. Daten

Step 2:

> AZ 826 MIF Developer PCN Letter
> AZ AZ 2026 MIF vs. AZ 826 MIF

> MSDS AZ 2026 MIF (german)
> MSDS AZ 2026 MIF (english)

Our New Products

Source:"Metal-Lift-off" © intelligent fluids®, intelligent-fluids.com

Our new Strippers

Photoresist Stripper SVD and SH5

The strippers easily removes layers of photoresists (PR) from inorganic substrates such as silicon, glass and metals (e.g. copper). The smart intelligent fluids® (IF) mode of action is not based on aggressive dissolving processes as in the case of many conventional products. Instead, intelligent fluids® enable a gentle physical detaching even of persistent layers, without damaging the substrate surface.

The strippers works with highly dynamic phase structures in two steps:

● infiltration and fragmentation of the layer
● wrapping and removal of fragments

Negative-tone photoresists will be detached in larger fragments and can be filtered off. Positive-tone photoresists on the other hand will be incorporated
into the fluid.

Advantages:

● water-based
● pH neutral to the skin (pH: 5.5 – 6.5)
● non-toxic, non-flammable
● safe-to-handle
● dermatologically tested - “excellent”
● readily biodegradable

More Information:

> Photoresist Stripper SVD
> Photoresist Stipper SH5

Technical Data Sheet:

For further information please refer to the technical data sheet:
> Photoresist Stripper SVD (TDS)
> Photoresist Stripper SH5 (TDS)

NOW AVAILABLE

Acetone and Isopropyl Alcohol from MicroChemicals

We are now offering our new MicroChemicals Acetone and Isopropyl Alcohol in ULSI quality. Our solvents are available in 2.5 L containers and can be ordered as single bottles or in the packaging unit of 4 x 2.5 L. Both products are ideal for substrate cleaning for organic contaminants and particles.

> Acetone
> Isopropyl Alcohol

> Info sheet
> Specification Acetone
> Specification Isopropyl Alcohol

If you are interested in further technical information or a free sample, please don't hestitate to contact us. > sales(at)microchemicals.com

New: Technical Guideline

Application Areas and Compatibilities of our Photoresists, Developers and Removers

With the information collected in this document, we would like to give you an initial overview of the basic areas of application and compatibility of our
photo chemicals.
Easily find the right developer, stripper and remover for your photoresist with our guideline.

We would be happy to advise you in more detail personally!

> Technical Guideline

Application Areas and Compatibilities
> Download PDF

Our Book Photolithography 2017

The last few months we have been working on a new edition of our brochures. For the first time, we have compiled all themes about photolithography in one softcover book. All contents and information of the previous edition have been revised, updated and renewed.

If you are interested in our book Photolithography - Basics of Microstructuring, please fill in the order form:

> book order

 

Semicon 2018 in Munich

We say thanks to all customers, partners and prospects who have visited us at Semicon and Productronica 2018 in Munich at our booth. It was a very successful show with important and interesting encounters for us.

Photolithographie - Basics of Microstructuring
(not available as PDF)