Merck Performance Materials GmbH

AZ P4K-AP Coating - 0.10 l

AZ® P4K-AP is a cost-effective coating for the protection of device surfaces during operations.

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Available in 14 days, delivery time 3-4 Tage

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0.10 l

0.25 l

0.50 l

1.00 l

2.50 l

3.785 l

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Product number: 1P4KAP0100

Manufacturer: Merck Performance Materials GmbH

Product information "AZ P4K-AP Coating - 0.10 l"

AZ^® P4K-AP

Protective Coating

General Information

AZ^® P4K-AP is a cost-effective coating for the protection of device surfaces during operations such as back-lap or backside etch. It is based on Novolak resin and is resistant to most etchants. The thickness of this coating is 6.8 µm at 4000 rpm spin speed. Please note, that the protective coating AZ^® P4K-AP is not stable in KOH-etches typically used for silicon etching.

Product Properties

AZ^® P4K-AP is a blend of resin and solvent components typical of fully formulated photoresists. The AZ^® P4K-AP Protective Coating excludes the photoactive component of a fully formulated photoresist, thus removing material and QA related costs for applications where photolithographic performance in unnecessary.

AZ^® P4K-AP uses the same base materials as the industry standard AZ^® P4620 photoresist. It offers:

Superior adhesion to a wide variety of substrates
Compatible with many wet chemistries, both etch and plating
Good coating properties
Standard photoresist coating processes are used

The AZ^® P4K-AP can be used in:

Dry etch processes
Wet etch processes
Plating processes

The AZ^® P4K-AP is removed/stripped in standard wet or dry photoresist removal processes.

Developers

AZ^® P4K-AP is not a photoresist, therefore there is no developer required.

Removers

AZ^® P4K-AP can be removed with all common photoresist strippers such as: Acetone, alkaline solutions, AZ^® 100 Remover, DMSO, AZ^® 920 Remover and TechniStrip P1316.

Thinning/ Edge Bead Removal

We recommend for thinning and edge bead removal PGMEA and AZ^® EBR Solvent.

Further Information

MSDS:
Safety Data Sheet AZ^® P4K-AP Photoresist english
Sicherheitsdatenblatt AZ^® P4K-AP Fotolack german

TDS:
Technical Data Sheet AZ^® P4K-AP Photoresist english

Application Notes:
Further Information about Photoresist Processing