TechniStrip P1316 - 5.00 l - MOS
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TechniStrip® P1316
High Performance Remover
General Information
TechniStrip® P1316 is a remover with very strong stripping power for Novolak-based resists (including all AZ® positive resists), epoxy-based coatings, polyimides and dry films. At a typical application temperatures around 75°C TechniStrip® P1316 may dissolve cross-linked resists without residue also, e.g. through dry etching or ion implantation. The remover can also be used in spraying processes.
Product Properties
- Flashpoint: 93°C
- Viscosity (20°C): < 2 cP
- Water Solubility: Totally miscible
- Boiling point: 189°C
- Density (at 20°C): 1.03 g/cm3
Compatibility
- Metals: attacked Al, Cu, Au
- Metals: no attack on Ta, Ni, Ti, TiN
- Substrates: Si, SiO2
Data on selectivity and compatibility are manufacturer information and do not claim to be complete. Please contact us for further details.
Some Applications
TechniStrip® P1316 is a powerful NMP-free remover for:
- Novolak-based positive resists such as all positive AZ® resists
- Epoxy-based resists
- Polyimides, bonding glues
- Dry films
Further Information
MSDS:
Safety Data Sheet TechniStrip P1316 (MOS) english
Sicherheitsdatenblatt TechniStrip P1316 (MOS) german
TDS:
Technical Data Sheet TechniStrip P1316 (MOS) english
Specs:
Specs TechniStrip P1316 (MOS)
Application Notes:
Photoresist Removal english
Fotolack entfernen german
| Bottle size: | 5.00 l |
|---|---|
| Compatible Substrates: | Si, SiO2 |
| Purity: | MOS |
| Selectivity (attacked): | Al, Au, Cu |
| Selectivity (no attack on): | Ni, Ta, Ti, TiN |
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