TechniStrip Micro D2 - 5.00 l - VLSI
Available, ready for dispatch in approx.: 3-4 Tage
TechniStrip® Micro D2
Remover with high metal and material compatibility
General Information
TechniStrip® Micro D2 is a versatile stripper which is dedicated to address resin lift off and dissolution on negative and positive tone resist. The organic mixture has the particularity to offer high metal and material compatibility allowing to be used on all stacks and particularly on sensitive substrates.
TechniStrip® Micro D2 is a very well suited substitute for the NMP and DMSO/Amine strippers, that are regarded as toxic since a while, or which are corrosive to some metals.
Product Properties
- Flashpoint: 87°C
- Water Solubility: Fully miscible
- Boiling point: 190°C
- Density (at 20°C): 1.113 g/cm3
Compatibility
- Metals: no attack on Al, Cu, Ni, Ta, TaN, Ti, TiN, TiW, Au, Ag, Sn
- Substrates: SiO2, Si
Data on selectivity and compatibility are manufacturer information and do not claim to be complete. Please contact us for further details.
Some Applications
- Positive resin stripping
- Negative tone resist lift off
- Lift off process to pattern metals and dielectric layers
- Reworking
- Adhesive, glue cleaner
Further Information
MSDS:
Safety Data TechniStrip Micro D2 (VLSI) english
Sicherheitsdatenblatt TechniStrip Micro D2 (VLSI) german
TDS:
Technical Data Sheet TechniStrip Micro D2 (VLSI) english
Specs:
Specs TechniStrip Micro D2 (VLSI)
Application Notes:
Photoresist Removal english
Fotolack entfernen german
| Bottle size: | 5.00 l |
|---|---|
| Compatible Substrates: | Si, SiO2 |
| Purity: | VLSI |
| Selectivity (no attack on): | Ag, Al, Au, Cu, Ni, Sn, Ta, TaN, Ti, TiN, TiW |
Related products
