Si + dry SiO2 wafer 4 inch 525 um (100) SSP B-doped
Prime Si + SiO2 (dry) (290 nm) wafer 525 µm 100
| Quantity | Unit price |
|---|---|
| To 49 |
€20.00*
|
| To 99 |
€18.50*
|
| From 100 |
€17.00*
|
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Product number:
WTD40525205B1050S293
Product information "Si + dry SiO2 wafer 4 inch 525 um (100) SSP B-doped"
Si + dry SiO2 wafer 4 inch, thickness = 525 ± 20 µm, (100), 1-side polished, p-type (Boron), TTV < 5 µm, Bow/Warp < 30 µm, 0.001 - 0.005 Ohm cm, 290 nm SiO2 (+/- 7 %), !! surface shows some kind of "haze" which can be cleaned !!
| Diameter (round): | 4 inch |
|---|---|
| Material: | Si + SiO2 (dry) (290 nm) |
| Orientation: | 100 |
| Quality: | Prime |
| Resistivity: | 0 - 0.01 Ohm cm |
| SiO2 thickness: | 201 - 300 nm |
| Surface: | 1-side polished |
| Thickness: | 501 - 700 µm |