Si + dry SiO2 wafer 2 inch 279 um (100) SSP B-doped
Prime Si + SiO2 (dry) (50 nm) wafer 279 µm 100
| Quantity | Unit price |
|---|---|
| To 4 |
€30.40*
|
| To 9 |
€21.40*
|
| To 24 |
€16.80*
|
| To 49 |
€12.00*
|
| To 99 |
€10.00*
|
| From 100 |
€9.50*
|
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Product number:
WTD20279200B1051S051
Product information "Si + dry SiO2 wafer 2 inch 279 um (100) SSP B-doped"
Prime Si + dry SiO2 wafer 2 inch, thickness = 279 ± 20 µm, (100), 1-side polished, p-type (Boron) TTV < 10 µm, 0.001 - 0.05 Ohm cm, 50 +/- 30 nm SiO2
| Diameter (round): | 2 inch |
|---|---|
| Material: | Si + SiO2 (dry) (50 nm) |
| Orientation: | 100 |
| Quality: | Prime |
| Resistivity: | 0 - 0.01 Ohm cm |
| SiO2 thickness: | 0 - 100 nm |
| Surface: | 1-side polished |
| Thickness: | 201 - 300 µm |