AZ Aquatar ®-VIII A 45 Antireflective Coating   General Information AZ® Aquatar -VIII A45 is a top layer anti-reflective coating for use with g- and i-line. AZ® Aquatar -VIII A45 acts like an optical coating at the interface photoresist/air and improves image contrast. Multiple reflections within the photoresist are also suppressed, the result is generally a reduction of the amplitude of the swing curve to 1/3rd. Application is very simple: it is just spun on top of the photoresist, no additional bake cycle is required and the standard development cycle removes it. This simple process reduces line width variation over topography significantly, however does not suppress reflective notching. Product Properties AZ® Aquatar -VIII A45 top anti-reflective coating is an aqueous material for use with positive photoresists in the semiconductor industry. The effect of the anti-reflective coating is to dramatically reduce the amplitude of the resist swing curve. When optimized this change in swing curve amplitude can be up to a factor of three times reduction. Optimum film thickness can be calculated using the following function: Film thickness = lambda : 4n lambda = wavelength of exposure light n = refractive index of AZ® Aquatar After exposure AZ® Aquatar top anti-reflective coating is removed using either a water rinse or the aqueous positive resist developer itself. As soon as the anti-reflective coating is removed the resist will develop as normal. An optimized process is confirmed when the original resist swing curve is seen to be exactly 180° out of phase with the modified swing curve derived from the use of AZ® Aquatar top anti-reflective coating. When this is not the case, there will still be a significant swing curve reduction but not to the same extent as a fully optimized process. When used with AZ® i-line photoresists, image bias, usually seen as a difference in dimension between dense and isolated lines is dramatically reduced to values close to 0 %. A top anti-reflective coating will not reduce reflective notching caused by exposing light being reflected from the substrate. For this process situation a bottom anti-reflective coating, AZ® Aquatar, AZ® Barli, is recommended. Developers All aqueous alkaline developers. Removers Not required, water soluble. Thinning/ Edge Bead Removal Not required, water soluble. Further Information MSDS: Safety Data Sheet AZ® Aquatar -VIII A45 Photoresist english Sicherheitsdatenblatt AZ® Aquatar -VIII A45 Fotolack german TDS: Technical Data Sheet AZ® Aquatar Photoresist english Technical Data Sheet AZ® Aquatar TARC english Info AZ® Aquatar EN Application Notes: Further Information about Photoresist Processing

AZ ® BARLiTM II 200 Antireflective Coating   General Information AZ® BARLiTM II is a bottom antireflective layer coating for use on highly reflective surfaces in the semiconductor industry. It is designed to work with as antireflective layer between photoresist and substrate and is optimized for i-line exposure tools. Upon completion of the lithographic process, AZ® BARLiTM II is patterned in a dry-etch process. Product Properties AZ®BARLiTM II coating material is formulated in photoresist-compatible solvents to simplify the EBR process and to be both environmental and user friendly. AZ®BARLiTM II is tailor-made to yield the near-optimum values for refractive indices (n and k) for i-line lithography, which ensures minimum reflectivity and maximum swing reduction for photoresist layers. Composed of highly absorptive polymer-bound dyes, this material provides excellent coating uniformity and step coverage. AZ®BARLiTM II shows high etch selectivity (comparable to AZ®BARLiTM) and high thermal stability up to 230°C. It does not show intermixing with photoresist when the bake temperature is higher than 180°C. AZ®BARLiTM II is available in two thickness grades, 900 A and 2000 A, in order to provide optimum film thickness for the first and the second swing minimum respectively at about 3000 rpm spin speed. Developers No restriction. Removers Dry Etching. Edge Bead Removal We recommend AZ® EBR 70/30 for edge bead removal for best performance. Further Information MSDS: Safety Data Sheet AZ®BARLiTM II 200 Photoresist english Sicherheitsdatenblatt AZ®BARLiTM II 200 Fotolack german TDS: Technical Data Sheet AZ®BARLiTM II Photoresist english Info AZ®BARLiTM II Photoresist english Info AZ®BARLiTM II Processing english Application Notes: Further Information about Photoresist Processing

AZ ® BARLiTM II 90 Antireflective Coating   General Information AZ® BARLiTM II is a bottom antireflective layer coating for use on highly reflective surfaces in the semiconductor industry. It is designed to work with as antireflective layer between photoresist and substrate and is optimized for i-line exposure tools. Upon completion of the lithographic process, AZ® BARLiTM II is patterned in a dry-etch process. Product Properties AZ®BARLiTM II coating material is formulated in photoresist-compatible solvents to simplify the EBR process and to be both environmental and user friendly. AZ®BARLiTM II is tailor-made to yield the near-optimum values for refractive indices (n and k) for i-line lithography, which ensures minimum reflectivity and maximum swing reduction for photoresist layers. Composed of highly absorptive polymer-bound dyes, this material provides excellent coating uniformity and step coverage. AZ®BARLiTM II shows high etch selectivity (comparable to AZ®BARLiTM) and high thermal stability up to 230°C. It does not show intermixing with photoresist when the bake temperature is higher than 180°C. AZ®BARLiTM II is available in two thickness grades, 900 A and 2000 A, in order to provide optimum film thickness for the first and the second swing minimum respectively at about 3000 rpm spin speed. Developers No restriction. Removers Dry Etching. Edge Bead Removal We recommend AZ® EBR 70/30 for edge bead removal for best performance. Further Information MSDS: Safety Data Sheet AZ®BARLiTM II 90 Photoresist english Sicherheitsdatenblatt AZ®BARLiTM II 90 Fotolack german TDS: Technical Data Sheet AZ®BARLiTM II Photoresist english Info AZ®BARLiTM II Photoresist english Info AZ®BARLiTM II Processing english Application Notes: Further Information about Photoresist Processing