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PGMEA - 5.00 l - ULSI

PGMEA is the main solvent of almost all our photoresists and can be used for dilution and edge bead removal.

Product information "PGMEA - 5.00 l - ULSI"

PGMEA

1-methoxy-2-propyl-acetate

 

General Information

PGMEA is the main solvent/thinner of almost all AZ® and TI photoresists due to its low vapour pressure and its suppression of particle formation in the (further diluted) resist. Additionally, PGMEA is often used for edge bead removal, since its low vapour pressure prevents further thinning of the coated resist film.

Product Properties
  • Density: 0.97 g/cm3
  • Melting point: -66°C
  • Boiling point: 125°C
  • Flash point: 45°C
  • Vapour pressure @ 20°C: 5 hPa

  PGMEA Molecule

PGMEA Molecule

Further Information

MSDS:
Safety Data Sheet PGMEA (ULSI) english
Sicherheitsdatenblatt PGMEA (ULSI) german

Specs:
Specs PGMEA (ULSI)

Application Notes:
Solvents: Theory and Application english
Lösemittel: Theorie und Anwendung german

Further Information about Processing

Purity: ULSI

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