TECHNIC France
Hydrogen peroxide 30% - 2.50 l - VLSI - PERSO+EVE/EUD!
H2O2 is an ingredient of the Piranha-etch, RCA-1 and RCA-2 etching solutions, as well as etching solutions for various III/V-semiconductors.
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Product number:
THOV1025
Manufacturer:
TECHNIC France
Product information "Hydrogen peroxide 30% - 2.50 l - VLSI - PERSO+EVE/EUD!"
Hydrogene Peroxide
H2O2
General Information
H2O2 is an ingredient of the Piranha-etch, RCA-1 and RCA-2 etching solutions, as well as etching solutions for various III/V-semiconductors.
H2O2 (30%) is available in VLSI-quality, which is the usual purity grades applied in semiconductor processing and micro-electronics.
Further Information
MSDS:
Safety Data Sheet Hydrogen Peroxide 30% (VLSI) english
Sicherheitsdatenblatt Hydrogen Peroxide 30% (VLSI) german
Specs:
Specs Hydrogen Peroxide 30% (VLSI)
Application Notes:
Wet Etching english
Nasschemisches Ätzen german
| Purity: | VLSI |
|---|
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