Hydrofluoric Acid EVE 50% - 2.50 l - VLSI - EVE/EUD!
Hydrofluoric Acid
HF
General Information
Hydrofluoric Acid is mainly used for etching glasses, quartz and SiO2 films as well as (mixed with HNO3) for isotropic silicon etching. We supply hydrofluoric acid (1%, 10% and 50%) in VLSI-quality, which is the usual purity grades applied in semiconductor processing and micro-electronics.
Further Information
MSDS:
Safety Data Sheet Hydrofluoric Acid 1% (VLSI) english
Sicherheitsdatenblatt Hydrofluoric Acid 1% (VLSI) german
Safety Data Sheet Hydrofluoric Acid 10% (VLSI) english
Sicherheitsdatenblatt Hydrofluoric Acid 10% (VLSI) german
Safety Data Sheet Hydrofluoric Acid 50% (VLSI) english
Sicherheitsdatenblatt Hydrofluoric Acid 50% (VLSI) german
Specs:
Specs Hydrofluoric Acid 1% (VLSI)
Specs Hydrofluoric Acid 10% (VLSI)
Specs Hydrofluoric Acid 50% (VLSI)
Application Notes:
Wet Etching english
Nasschemisches Ätzen german
| Compatible Substrates: | Glass, Quartz, SiO2 |
|---|---|
| Purity: | VLSI |
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