Skip to main content

Acetone MC - 2.50 l - ULSI - EUD/EVE!

Acetone is ideal for substrate cleaning and removes organic contaminants and particles.

Product information "Acetone MC - 2.50 l - ULSI - EUD/EVE!"

Acetone

CH3COCH3

 

General Information

Acetone removes organic impurities from substrates and is well suited for greasy/oily contaminations. However, its large vapour pressure causes rapid drying together with a resorption of the contaminants on the substrate. Therefore an immediately subse¬quent rinsing step is recommended with a higher boiling solvent such as isopropanol. Acetone is not well-suited as lift-off medium due to the high fire danger when heated and the trend of particles to be lifted to resorb onto the substrate.

Product Properties
  • Density: 0.79 g/cm^3
  • Melting point: 95°C
  • Boiling point: 56°C
  • Flash point: < -18°C
  • Vapour pressure @ 20°C: 244 hPa

  Acetone

Acetone Molecule

Further Information

MSDS:
Safety Data Sheet Acetone english (TECHNIC France)
Sicherheitsdatenblatt Aceton german (TECHNIC France)

Safety Data Sheet Acetone english (MicroChemicals GmbH)
Sicherheitsdatenblatt Aceton german (MicroChemicals GmbH)

Specs:
Specs Acetone ULSI (TECHNIC France)
Specs Acetone VLSI (TECHNIC France)
Specs Acetone ULSI (MicroChemicals GmbH)

Application Notes:
Solvents english
Lösemittel german

Related products

n-Butylacetat - 5.00 l - VLSI
TNBAV1050
Butyl Acetate C6H12O2   General Information Butyl Acetate is a solvent with a boiling point of 127°C. The vapour pressure at room temperature is 10.7 hPa. Butyl Acetate has the chemical formula C6H12O2. It can be easily solved in nonpolar (organic) solvents, but fairly bad in water (4.3 g per Litre). Product Properties Density: 0.88 g/cm3 Melting point: -77°C Boiling point: 127°C Flash point: 27°C Vapour pressure @ 20°C: 10.7 hPa Further Information MSDS: Safety Data Sheet Butyl Acetate (VLSI) english Sicherheitsdatenblatt Butyl Acetate (VLSI) german Specs: Specs Butyl Acetate (VLSI) Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
Cyclopentanon - 2.50 l - ULSI
TCYU1025
Cyclopentanone C5H8O   General Information Cyclopentanone is often used in conjunction with epoxy-based resist formulations, as well as an organic developer for cross-linking photoresists such as e-beam resists. Product Properties Density: 0.88 g/cm3 Melting point: -77°C Boiling point: 127°C Flash point: 27°C Vapour pressure @ 20°C: 10.7 hPa   Cyclopentanone Molecule Further Information MSDS: Safety Data Sheet Cyclopentanon (ULSI) english Sicherheitsdatenblatt Cyclopentanon (ULSI) german Specs: Specs Cyclopentanon (ULSI) Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
DMSO - 2.50 l - ULSI
MDMU1025
DMSO Dimethyl Sulfoxide   General Information Due to its low vapour pressure and its water solubility, DMSO is an excellent stripper for resists respectively Lift-off media and is a non-toxic substitute for the NMP, which has been classified as toxic since a while. The optional addition of Cyclopentanone or MEK increases the performance of the stripper for certain applications and significantly lowers the melting point of pure DMSO. NOTE: The solvent DMSO (dimethyl sulfoxide) has a melting point just below room temperature, so it can possi¬bly freeze in storage in cooler rooms. Thawing may require several days, but afterwards the product can still be used as it is. For more details please download the info letter. Product Properties Density: 1.1 g/cm3 Melting point: 18°C Boiling point: 189°C Flash point: 87°C Vapour pressure @ 20°C: 0.56 hPa   DMSO Molecule Further Information MSDS: Safety Data Sheet DMSO (ULSI) english Sicherheitsdatenblatt DMSO (ULSI) german Specs: Specs DMSO (ULSI) Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Photoresist Removal english Fotolack entfernen german Further Information about Processing
Isopropyl Alcohol MC - 2.50 l - ULSI
MIPU1025
Manufacturer: MicroChemicals GmbH | Bottle size: 2.50 l | Purity: ULSI
Isopropyl Alcohol IPA, 2-propanol   General Information Isopropyl alcohol is well-suited for rinsing contaminated acetone as well as removing particles from surfaces. Therefore, this solvent is often used in the second substrate cleaning step after acetone. Additionally, Isopropyl alcohol is used as additive for anisotropic Si-etching. Product Properties Density: 0.78 g/cm3 Melting point: - 88°C Boiling point: 82°C Flash point: 13°C Vapour pressure @ 20°C: 43 hPa   Isopropyl alcohol Molecule* Further Information MSDS: Safety Data Sheet Isopropyl Alcohol (ULSI) english Sicherheitsdatenblatt Isopropyl Alcohol (ULSI) german Safety Data Sheet Isopropyl Alcohol (VLSI) english Sicherheitsdatenblatt Isopropyl Alcohol (VLSI) german Specs: Specs Isopropyl Alcohol (ULSI) Specs Isopropyl Alcohol (VLSI) Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
MEK - 2.50 l - ULSI - EVE/EUD!
MMEU1025
MEK Methyl Ethyl Ketone   General Information MEK (methyl ethyl ketone) with its low boiling point can be used as MicroChemicals additional thinner for spray coating resists, which require a fast resist film drying on the substrate. Product Properties Density: 0.81 g/cm3 Melting point: -86°C Boiling point: 80°C Flash point: -4°C Vapour pressure @ 20°C: 105 hPa   MEK Molecule Further Information MSDS: Safety Data Sheet MEK (ULSI) english Sicherheitsdatenblatt MEK (ULSI) german Specs: Specs MEK (ULSI) Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
Methanol - 2.50 l - VLSI - EVE/EUD!
TMLU1025
Methanol Methylalcohol   General Information Methanol can be used for improved substrate cleaning due to its good dissolving power for contaminated acetone in a three-stage cleaning process (acetone à methanol à isopropyl alcohol). Due to its toxicity, its application should be weighed against its potential benefits. Product Properties Density: 0.79 g/cm3 Melting point: -98°C Boiling point: 65°C Flash point: 11°C Vapour pressure @ 20°C: 129 hPa   Methanol Molecule Further Information MSDS: Safety Data Sheet Methanol (ULSI) english Sicherheitsdatenblatt Methanol (ULSI) german Specs: Specs Methanol (ULSI) Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
MIBK - 2.50 l - VLSI - EVE/EUD!
TMIV1025
MIBK Methyl Isobuthyl Ketone   General Information MIBK is used in microelectronics as a developer for e-beam resists among other things. Product Properties Density: 0.80 g/cm3 Melting point: -80°C Boiling point: 116°C Flash point: 14°C Vapour pressure @ 20°C: 19 hPa   MIBK Molecule Further Information MSDS: Safety Data Sheet MIBK (VLSI) english Sicherheitsdatenblatt MIBK (VLSI) german Specs: Specs MIBK (VLSI) Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
PGMEA - 5.00 l - ULSI
MPGU1050
PGMEA 1-methoxy-2-propyl-acetate   General Information PGMEA is the main solvent/thinner of almost all AZ® and TI photoresists due to its low vapour pressure and its suppression of particle formation in the (further diluted) resist. Additionally, PGMEA is often used for edge bead removal, since its low vapour pressure prevents further thinning of the coated resist film. Product Properties Density: 0.97 g/cm3 Melting point: -66°C Boiling point: 125°C Flash point: 45°C Vapour pressure @ 20°C: 5 hPa   PGMEA Molecule Further Information MSDS: Safety Data Sheet PGMEA (ULSI) english Sicherheitsdatenblatt PGMEA (ULSI) german Specs: Specs PGMEA (ULSI) Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
MC Spray Thinner MEK - 5.00 l
1SPTHM005
Bottle size: 5.00 l
MC Spray Thinner MEK Solvent for Spray Coating   General Information Spray Thinner MEK is a solvent for the production of a spray coating formulation. As the name suggests, this thinner is based on a formulation of MEK and various surfactants, which help to achieve an optimal spray coating result. Spray coating formulations are often made from three components - the low-boiling Spray Thinner MEK, the high-boiling Spray Thinner PGMEA and the corresponding resist. Depending on the mixing ratio and the wanted result, the proportions of the substances must be adjusted. A high proportion of PGMEA (low vapor pressure) creates very smooth layers with moderate edge coverage, while a formulation with a high MEK content (high vapor pressure) creates very good edge coverage but comparatively rough layers. The optimal compromise of the solvent mixture is often a mixing ratio MEK: PGMEA of 1:3 to 3:1. Depending on the viscosity, required by the spray coating tool used, this solvent mixture is added to the resist in a ratio of 1:3 to 1:10. So one part resist to 3 parts solvent mixture up to one part resist to 10 parts solvent mixture. Further Information MSDS: Safety Data Sheet MC Spray Thinner MEK english Sicherheitsdatenblatt MC Spray Thinner MEK german Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
MC Spray Thinner PGMEA - 5.00 l
1SPTHP005
Bottle size: 5.00 l
MC Spray Thinner PGMEA Solvent for Spray Coating   General Information Spray Thinner PGMEA is a solvent for the production of a spray coating formulation. As the name suggests, this thinner is based on a formulation of PGMEA and various surfactants, which help to achieve an optimal spray coating result. Spray coating formulations are often made from three components - the high-boiling Spray Thinner PGMEA, the low-boiling MEK Spray Thinner, and the corresponding resist. Depending on the mixing ratio and the wanted result, the proportions of the substances must be adjusted. A high proportion of PGMEA (low vapour pressure) creates very smooth layers with moderate edge coverage, while a formulation with a high MEK content (high vapour pressure) creates very good edge coverage but comparatively rough layers. The optimal compromise of the solvent mixture is often a mixing ratio MEK: PGMEA of 1:3 to 3:1. Depending on the viscosity, required by the spray coating tool used, this solvent mixture is added to the resist in a ratio of 1:3 to 1:10. So one part resist to 3 parts solvent mixture up to one part resist to 10 parts solvent mixture. Further Information MSDS: Safety Data Sheet MC Spray Thinner PGMEA english Sicherheitsdatenblatt MC Spray Thinner PGMEA german Application Notes: Solvents: Theory and Application english Lösemittel: Theorie und Anwendung german Further Information about Processing
TechniStrip Micro D350 - 2.50 l - ULSI
TD350U1025
Bottle size: 2.50 l
TechniStrip Micro D350 DMSO-based Stripper   General Information TechniStrip® Micro D350 is a DMSO-based stripper and is a very well suited non-toxic substitute for the NMP that is regarded as toxic since a while. As a stripper or as lift off media, TechniStrip® Micro D350 can be regarded as a non toxic alternative to NMP. Mixtures with Cyclopentanone or with MEK even increase the strip performance of this product. NOTE: The solvent TechniStrip® Micro D350 has a melting point just below room temperature, so it can possi¬bly freeze in storage in cooler rooms. Thawing may require several days, but afterwards the product can still be used as it is. For more details please download the info letter. Further Information MSDS: Safety Data Sheet TechniStrip Micro D350 (ULSI) english Sicherheitsdatenblatt TechniStrip Micro D350 (ULSI) german TDS: Technical Data Sheet TechniStrip Micro D350 (ULSI) english Specs: Specs TechniStrip Micro D350 (ULSI) Application Notes: Photoresist Removal english Fotolack entfernen german Further Information about Processing
AZ EBR Solvent - 5.00 l
1000002
Bottle size: 5.00 l
AZ® EBR Solvent 1-methoxy-2-propyl-acetate   General Information AZ® EBR Solvent is the main solvent/thinner of almost all AZ® and TI photoresists due to its low vapour pressure and its suppression of particle formation in the (further diluted) resist. Additionally, PGMEA is often used for edge bead removal, since its low vapour pressure prevents further thinning of the coated resist film. Product Properties Density: 0.97 g/cm3 Melting point: -66°C Boiling point: 125°C Flash point: 45°C Vapour pressure @ 20°C: 5 hPa   PGMEA Molecule Further Information MSDS: Safety Data Sheet AZ® EBR Solvent english Sicherheitsdatenblatt AZ® EBR Solvent german TDS: Technical Data Sheet AZ® EBR Solvent english