Merck Performance Materials GmbH

AZ Remover 910 - 5.00 l

AZ® Remover 910 is a highly efficient photoresist stripper based on solvent and an alkaline component.

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Product number: 1000910

Manufacturer: Merck Performance Materials GmbH

Product information "AZ Remover 910 - 5.00 l"

AZ^® Remover 910

Organic Solvent Based Remover

General Information

AZ^® Remover 910 is designed to strip and dissolve positive and negative-tone, chemically amplified and DNQ/Novolak resists. It is a solvent based product that contains acids and is therefore acidic. The formulation is EH&S friendly, it contains no NMP, DMAC, DMSO and no TMAH and it is amine free.
It is especially suited for our cross-linking negative resists such as AZ^® nLof 2070, 2035 and 2020, the AZ^® nLof 5110 and the AZ^® 15nXT series resists.

Compatibility

It is suitable for processes where sensitive metals and other materials are exposed. It shows low etch rates on:

Al, Cu, Ti, W, TiW, TiN, Sn, Ni
Si, SiO2

Data on selectivity and compatibility are manufacturer information and do not claim to be complete. Please contact us for further details.

Further Information

MSDS:
Safety Data Sheet AZ^® Remover 910 english
Sicherheitsdatenblatt AZ^® Remover 910 german

TDS:
Technical Data Sheet AZ^® Remover 910 english

Application Notes:
Photoresist Removal english
Entfernen von Fotolack german