AZ Barli II 90 - 3.785 l

AZ ^® BARLi^TM II 90

Antireflective Coating

General Information

AZ^® BARLi^TM II is a bottom antireflective layer coating for use on highly reflective surfaces in the semiconductor industry. It is designed to work with as antireflective layer between photoresist and substrate and is optimized for i-line exposure tools. Upon completion of the lithographic process, AZ^® BARLi^TM II is patterned in a dry-etch process.

Product Properties

AZ^®BARLi^TM II coating material is formulated in photoresist-compatible solvents to simplify the EBR process and to be both environmental and user friendly. AZ^®BARLi^TM II is tailor-made to yield the near-optimum values for refractive indices (n and k) for i-line lithography, which ensures minimum reflectivity and maximum swing reduction for photoresist layers. Composed of highly absorptive polymer-bound dyes, this material provides excellent coating uniformity and step coverage. AZ^®BARLi^TM II shows high etch selectivity (comparable to AZ^®BARLi^TM) and high thermal stability up to 230°C. It does not show intermixing with photoresist when the bake temperature is higher than 180°C. AZ^®BARLi^TM II is available in two thickness grades, 900 A and 2000 A, in order to provide optimum film thickness for the first and the second swing minimum respectively at about 3000 rpm spin speed.

Developers

No restriction.

Removers

Dry Etching.

Edge Bead Removal

We recommend AZ^® EBR 70/30 for edge bead removal for best performance.

Further Information

MSDS:
Safety Data Sheet AZ^®BARLi^TM II 90 Photoresist english
Sicherheitsdatenblatt AZ^®BARLi^TM II 90 Fotolack german

TDS:
Technical Data Sheet AZ^®BARLi^TM II Photoresist english
Info AZ^®BARLi^TM II Photoresist english
Info AZ^®BARLi^TM II Processing english

Application Notes:
Further Information about Photoresist Processing