AZ Barli II 200 - 0.25 l
Available in 28 days, delivery time 3-4 Tage
AZ ® BARLiTM II 200
Antireflective Coating
General Information
AZ® BARLiTM II is a bottom antireflective layer coating for use on highly reflective surfaces in the semiconductor industry. It is designed to work with as antireflective layer between photoresist and substrate and is optimized for i-line exposure tools. Upon completion of the lithographic process, AZ® BARLiTM II is patterned in a dry-etch process.
Product Properties
AZ®BARLiTM II coating material is formulated in photoresist-compatible solvents to simplify the EBR process and to be both environmental and user friendly. AZ®BARLiTM II is tailor-made to yield the near-optimum values for refractive indices (n and k) for i-line lithography, which ensures minimum reflectivity and maximum swing reduction for photoresist layers. Composed of highly absorptive polymer-bound dyes, this material provides excellent coating uniformity and step coverage. AZ®BARLiTM II shows high etch selectivity (comparable to AZ®BARLiTM) and high thermal stability up to 230°C. It does not show intermixing with photoresist when the bake temperature is higher than 180°C. AZ®BARLiTM II is available in two thickness grades, 900 A and 2000 A, in order to provide optimum film thickness for the first and the second swing minimum respectively at about 3000 rpm spin speed.
Developers
No restriction.
Removers
Dry Etching.
Edge Bead Removal
We recommend AZ® EBR 70/30 for edge bead removal for best performance.
Further Information
MSDS:
Safety Data Sheet AZ®BARLiTM II 200 Photoresist english
Sicherheitsdatenblatt AZ®BARLiTM II 200 Fotolack german
TDS:
Technical Data Sheet AZ®BARLiTM II Photoresist english
Info AZ®BARLiTM II Photoresist english
Info AZ®BARLiTM II Processing english
Application Notes:
Further Information about Photoresist Processing