AZ AQUATAR-VIII-A 45 - 3.785 l
Available, ready for dispatch in approx.: 3-4 Tage
AZ Aquatar ®-VIII A 45
Antireflective Coating
General Information
AZ® Aquatar -VIII A45 is a top layer anti-reflective coating for use with g- and i-line. AZ® Aquatar -VIII A45 acts like an optical coating at the interface photoresist/air and improves image contrast. Multiple reflections within the photoresist are also suppressed, the result is generally a reduction of the amplitude of the swing curve to 1/3rd. Application is very simple: it is just spun on top of the photoresist, no additional bake cycle is required and the standard development cycle removes it. This simple process reduces line width variation over topography significantly, however does not suppress reflective notching.
Product Properties
AZ® Aquatar -VIII A45 top anti-reflective coating is an aqueous material for use with positive photoresists in the semiconductor industry. The effect of the anti-reflective coating is to dramatically reduce the amplitude of the resist swing curve. When optimized this change in swing curve amplitude can be up to a factor of three times reduction. Optimum film thickness can be calculated using the following function:
Film thickness = lambda : 4n
lambda = wavelength of exposure light n = refractive index of AZ® Aquatar
After exposure AZ® Aquatar top anti-reflective coating is removed using either a water rinse or the aqueous positive resist developer itself. As soon as the anti-reflective coating is removed the resist will develop as normal. An optimized process is confirmed when the original resist swing curve is seen to be exactly 180° out of phase with the modified swing curve derived from the use of AZ® Aquatar top anti-reflective coating. When this is not the case, there will still be a significant swing curve reduction but not to the same extent as a fully optimized process. When used with AZ® i-line photoresists, image bias, usually seen as a difference in dimension between dense and isolated lines is dramatically reduced to values close to 0 %. A top anti-reflective coating will not reduce reflective notching caused by exposing light being reflected from the substrate. For this process situation a bottom anti-reflective coating, AZ® Aquatar, AZ® Barli, is recommended.
Developers
All aqueous alkaline developers.
Removers
Not required, water soluble.
Thinning/ Edge Bead Removal
Not required, water soluble.
Further Information
MSDS:
Safety Data Sheet AZ® Aquatar -VIII A45 Photoresist english
Sicherheitsdatenblatt AZ® Aquatar -VIII A45 Fotolack german
TDS:
Technical Data Sheet AZ® Aquatar Photoresist english
Technical Data Sheet AZ® Aquatar TARC english
Info AZ® Aquatar EN
Application Notes:
Further Information about Photoresist Processing
Related products
