AZ 400 K Dev 1:4 - 5.00 l
Merck Performance Materials GmbH
AZ® 400K Developer 1:4 is a buffered, KOH based developer formulation for many positive and image reversal resists.
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Product number:
1004145
Manufacturer:
Merck Performance Materials GmbH
Product information "AZ 400 K Dev 1:4 - 5.00 l"
AZ® 400K Developer 1:4
Inorganic, Metal Ion Containing Developer
General Information
AZ® 400K Developer 1:4 is a boric acid buffered, KOH-based ready-to-use developer for non-chemically amplified positive resists.
Product Features
AZ® 400K Developer 1:4 is an AZ® 400K that has already been pre-diluted for use. As a KOH-based developer, this developer is particularly suitable for developing thicker, non-chemically amplified positive resists, but can also be used for thinner resist layers if the resolution requirements are not too high. AZ® 400K Developer is less suitable for negative resists or chemically amplified positive resists; TMAH-based developers such as the AZ® 326 MIF, AZ® 726 MIF or AZ® 2026 MIF are recommended here. AZ® 400K Developer attacks aluminum with an etching rate of - depending on the concentration of the developer dilution - several 10 nm/min to over 100 nm/min. If this cannot be tolerated, the Al-compatible AZ® Developer can be an alternative.
Further Information
Our safety data sheets and some of our technical data sheets are password-protected.
You will receive the access data after completing the form.
The access data for the data sheets are not your login data from our shop!
MSDS:
Safety Data Sheet AZ® 400K 1:4 Developer english
Safety Data Sheet AZ® 400K 1:4 Developer german
TDS:
Technical Data Sheet AZ® 400K 1:4 Developer english
Information AZ® 400K 1:4 Developer english
Application Notes:
Development of Photoresist english
Development of Photoresist german
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AZ® 400K Developer
Inorganic, Metal Ion Containing Developer
General Information
AZ® 400K Developer is a boric acid buffered, KOH-based developer for non-chemically amplified positive resists.
Product Features
As a KOH-based developer, AZ® 400K is particularly suitable for developing thicker, non-chemically amplified positive resists, but can also be used for thinner resist layers if the resolution requirements are not too high. AZ® 400K comes as a concentrate and is usually diluted 1: 4 with water. To increase selectivity, a 1: 5 - 1:6 dilution can also be selected, but this significantly reduces the development rate and is therefore not a reasonable option for thick resist processing. For very thick resist films and/or very steep resist sidewalls are not required, AZ® 400K can also be used at a stronger dilution (1:3.5 - 1:3), which increases the development rate but significantly increases the dark removal. AZ® 400K is less suitable for negative resists or chemically amplified positive resists; TMAH-based developers such as the AZ® 326 MIF, AZ® 726 MIF or AZ® 2026 MIF are recommended here. AZ® 400K attacks aluminum with an etching rate of - depending on the concentration of the developer dilution - several 10 nm/min to over 100 nm/min. If this cannot be tolerated, the Al-compatible AZ® Developer can be an alternative.
Further Information
Our safety data sheets and some of our technical data sheets are password-protected.
You will receive the access data after completing the form.
The access data for the data sheets are not your login data from our shop!
MSDS:
Safety Data Sheet AZ® 400K Developer english
Safety Data Sheet AZ® 400K Developer german
TDS:
Technical Data Sheet AZ® 400K Developer english
Information AZ® 400K Developer english
Application Notes:
Development of Photoresist english
Development of Photoresist german
AZ Developer - 5.00 l
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AZ® Developer
Inorganic, Metal Ion Containing Developer
General Information
AZ® Developer is a sodium salt-based, aluminum-compatible developer for non-chemically amplified positive resists.
Product Features
AZ® Developer is based on an aqueous Sodium metasilicate/Sodium phosphate solution. In contrast to NaOH, KOH or TMAH-based developers, this developer does not show any significant aluminum attack and is suitable for the development of non-chemically amplified positive resists. For thicker resist layers or when the requirements for resolution and steepness of the resist sidewalls are not too high, the AZ® Developer can be used undiluted. For thin resists and higher resolution requirements, it can be diluted 1:1 with water. An AZ® Developer: Water = 2:1 dilution represents a good compromise for many applications. For negative resists or chemically amplified positive resists, the AZ® Developer usually does not show satisfactory results. TMAH-based developers are recommended for these, but these are not aluminum compatible.
Further Information
Our safety data sheets and some of our technical data sheets are password-protected.
You will receive the access data after completing the form.
The access data for the data sheets are not your login data from our shop!
MSDS:
Safety Data Sheet AZ® Developer english
Safety Data Sheet AZ® Developer german
TDS:
Technical Data Sheet AZ® Developer english
Application Notes:
Development of Photoresist english
Development of Photoresist german
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AZ® 303 Developer
Inorganic, Metal Ion Containing Developer
General Information
AZ® 303 MIC is a KOH and NaOH based developer for positive and negative resists.
Product Features
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Further Information
Our safety data sheets and some of our technical data sheets are password-protected.
You will receive the access data after completing the form.
The access data for the data sheets are not your login data from our shop!
MSDS:
Safety Data Sheet AZ® 303 Developer english
Safety Data Sheet AZ ® 303 Entwickler german
TDS:
Technical Data Sheet AZ® 303 Developer english
Application Notes:
Development of Photoresist english
Development of Photoresist german
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Inorganic, Metal Ion Containing Developer
General Information
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Product Features
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Further Information
Our safety data sheets and some of our technical data sheets are password-protected.
You will receive the access data after completing the form.
The access data for the data sheets are not your login data from our shop!
MSDS:
Safety Data Sheet AZ® 351B Developer english
Safety Data Sheet AZ® 351B Entwickler german
TDS:
Technical Data Sheet AZ® 351B Developer english
Application Notes:
Development of Photoresist english
Development of Photoresist german
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AZ® 340 Developer
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General Information
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Further Information
MSDS:
Safety Data Sheet AZ® 340 Developer english
Sicherheitsdatenblatt AZ® 340 Developer german
TDS:
Technical Data Sheet AZ® 340 Developer english
Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german
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General Information
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Further Information
MSDS:
Safety Data Sheet AZ® Developer 1:1 english
Sicherheitsdatenblatt AZ® Developer 1:1 german
TDS:
Technical Data Sheet AZ® Developer 1:1 english
Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german