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AZ 400 K Dev 1:4 - 5.00 l

AZ® 400K Developer 1:4 is a buffered, KOH based developer formulation for many positive and image reversal resists.

Product information "AZ 400 K Dev 1:4 - 5.00 l"

AZ® 400K Developer 1:4

Inorganic Developers

 

General Information

In addition to the concentrate, a pre-diluted AZ® 400K 1:4 version is now also available, other dilution ratios on request.
AZ® 400K MIC Developer is based on buffered KOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water) and can be used especially for our thicker resist types, such as AZ® 4562, AZ® 10XT, and AZ® 40XT.

Further Information

MSDS:
Safety Data Sheet AZ® 400K 1:4 Developer english
Sicherheitsdatenblatt AZ® 400K 1:4 Entwickler german

TDS:
Technical Data Sheet AZ® 400K 1:4 Developer english
Information AZ® 400K 1:4 Developer english

Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german

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