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AZ 351 B Developer - 5.00 l

AZ® 351B Developer is a buffered, NaOH based developer concentrate for many positive and image reversal resists.

Product information "AZ 351 B Developer - 5.00 l"

AZ® 351B Developer

Inorganic Developers

 

General Information

AZ® 351B Developer is based on buffered NaOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water). 1:3 dilution is the high speed setup while 1:4 will be used for a high contrast setup. It can be used especially for our thinner resist types, such as AZ® 1500 Series resists or image reversal resists such as AZ® 5200E resist series.

Further Information

MSDS:
Safety Data Sheet AZ® 351B Developer english
Sicherheitsdatenblatt AZ® 351B Entwickler german

TDS:
Technical Data Sheet AZ® 351B Developer english

Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german

Developer Type: inorganic, metal ion containing (MIC)

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