AZ 303 Developer - 5.00 l
Merck Performance Materials GmbH
AZ® 303 Developer is a KOH and NaOH based formulation with strong surfactants for aqueous alkaline developable resists.
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Product number:
1000303
Manufacturer:
Merck Performance Materials GmbH
Product information "AZ 303 Developer - 5.00 l"
AZ® 303 Developer
Inorganic Developers
General Information
AZ® 303 MIC is a KOH and NaOH based developer for positive and negative resists.
Product Features
AZ® 303 Developer is based on an aqueous KOH and NaOH solution and contains strong surfactants. It is compatible with positive and negative resists and is therefore suitable, for example, as the only non-TMAH-based developer for the AZ® nLOF 2000 series. AZ® 303 Developer is usually used diluted 1: 5 - 1:10 with water.
Further Information
Our safety data sheets and some of our technical data sheets are password-protected.
You will receive the access data after completing the form.
The access data for the data sheets are not your login data from our shop!
MSDS:
Safety Data Sheet AZ® 303 Developer english
Safety Data Sheet AZ ® 303 Entwickler german
TDS:
Technical Data Sheet AZ® 303 Developer english
Application Notes:
Development of Photoresist english
Development of Photoresist german
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AZ® 351B Developer
Inorganic Developers
General Information
AZ® 351B Developer is a boric acid buffered, NaOH-based developer for non-chemically amplified positive resists.
Product Features
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Further Information
Our safety data sheets and some of our technical data sheets are password-protected.
You will receive the access data after completing the form.
The access data for the data sheets are not your login data from our shop!
MSDS:
Safety Data Sheet AZ® 351B Developer english
Safety Data Sheet AZ® 351B Entwickler german
TDS:
Technical Data Sheet AZ® 351B Developer english
Application Notes:
Development of Photoresist english
Development of Photoresist german
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AZ® 400K Developer
Inorganic Developers
General Information
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Further Information
MSDS:
Safety Data Sheet AZ® 400K Developer english
Sicherheitsdatenblatt AZ® 400K Entwickler german
TDS:
Technical Data Sheet AZ® 400K Developer english
Information AZ® 400K Developer english
Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german
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Inorganic Developers
General Information
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Further Information
MSDS:
Safety Data Sheet AZ® Developer english
Sicherheitsdatenblatt AZ® Developer german
TDS:
Technical Data Sheet AZ® Developer english
Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german
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Inorganic Developers
General Information
In addition to the concentrate, a pre-diluted AZ® 400K 1:4 version is now also available, other dilution ratios on request.
AZ® 400K MIC Developer is based on buffered KOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water) and can be used especially for our thicker resist types, such as AZ® 4562, AZ® 10XT, and AZ® 40XT.
Further Information
MSDS:
Safety Data Sheet AZ® 400K 1:4 Developer english
Sicherheitsdatenblatt AZ® 400K 1:4 Entwickler german
TDS:
Technical Data Sheet AZ® 400K 1:4 Developer english
Information AZ® 400K 1:4 Developer english
Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german
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Inorganic Developers
General Information
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Further Information
MSDS:
Safety Data Sheet AZ® 340 Developer english
Sicherheitsdatenblatt AZ® 340 Developer german
TDS:
Technical Data Sheet AZ® 340 Developer english
Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german
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Inorganic Developers
General Information
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Further Information
MSDS:
Safety Data Sheet AZ® Developer 1:1 english
Sicherheitsdatenblatt AZ® Developer 1:1 german
TDS:
Technical Data Sheet AZ® Developer 1:1 english
Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german