AZ 12XT-20PL-10 Photoresist - 3.785 l
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AZ® 12XT-20PL-10
Chemically Amplified Positive Tone Photoresists
General Information
AZ® 12XT for 5 - 15 µm Resist Film Thickness (i-line) The AZ® 12XT is a chemically amplified thick positive resist with superior photospeed and aspect ratio characterized by its excellent environmental stability and suitability for plating and RIE etc applications. Even for very high resist film thickness AZ® 12XT requires only short softbake times, no delay for rehydration, very small exposure doses due to its chemical amplification and reveals a high development rate.
AZ® 12XT - 2.4mm lines at 10mm film thickness
Product Properties
- High thermal stability
- Compatible with all common TMAH based developers
- Compatible with all common strippers (e.g. with AZ® 100 Remover, organic solvents, or aqueous alkaline)
- i-line sensitive (approx. 320 - 390 nm)
- Resist film thickness range approx. 5 - 20 µm
Developers
We recommend the TMAH-based developers such as the AZ® 326 MIF, AZ® 726 MIF or AZ® 2026 MIF developer.
Removers
The AZ® 12XT resists are compatible with industry standard solvent based removers such as AZ® 920 Remover, AZ® 100 Remover and DMSO based strippers.
Thinning/ Edge Bead Removal
We recommend for thinning and edge bead removal AZ® EBR Solvent or AZ® EBR70/30 Solvent.
Further Information
MSDS:
Safety Data Sheet AZ® 12XT 20PL-10 english
Sicherheitsdatenblatt AZ® 12XT 20PL-10 german
TDS:
Technical Data Sheet AZ® 12XT 20PL-10 english
Application Notes:
Further Information about Photoresist Processing
| Chemically amplified: | yes |
|---|---|
| Film thickness: | 5.0 – 20.0 µm |
| Film thickness range: | thick (> 5.1µm) |
| High thermal stability: | yes |
| Mode: | positive |
| Optimized for: | dry etching, electroplating |
Related products
Developer
Remover
