Merck Performance Materials GmbH

AZ 100 Remover - 5.00 l

AZ® 100 Remover is a highly efficient photoresist stripper based on solvent and an alkaline component.

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Product number: 1000100

Manufacturer: Merck Performance Materials GmbH

Product information "AZ 100 Remover - 5.00 l"

AZ^® 100 Remover

Universal Photoresist Stripper

General Information

AZ^®100 Remover is based on solvent and amine (alkaline). AZ^®100 Remover is used for photoresist stripping with low attack to aluminium. Low hazard is achieved by the use of ethanol amine.
Low evaporation rate allows the use at elevated temperatures (up to 80°C), high efficiency (>3000 wafer per litre) helps saving costs. Where attack to aluminium is of no concern, it may even be diluted with water.
AZ^®100 Remover is not compatible with AZ^® nLof 2070 (AZ^® nLof 2000 series) resists and other heavily cross linked resists.

Product Properties

Density (at 25°C): 0.955 kg/l
Color (Alpha): max. 20
Flashpoint (AP): 72°C
Normality (potentiometric): 3.1 mol/l
Boiling range: 159-194°C

Further Information

MSDS:
Safety Data Sheet AZ^® 100 Remover english
Sicherheitsdatenblatt AZ^® 100 Remover german

TDS:
Technical Data Sheet AZ^® 100 Remover english

Application Notes:
Photoresist removal english
Fotolack entfernen german