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Si + wet SiO2 wafer 4 inch 525 um (111) SSP P-doped

Prime Si + SiO2 (wet) (0 nm) wafer 525 µm 111

Produktinformationen "Si + wet SiO2 wafer 4 inch 525 um (111) SSP P-doped"

Prime Si + wet SiO2 wafer 4 inch, thickness = 525 ± 25 µm, (111), 1-side polished, n-type (Phosphor) TTV < 10 µm, 1 - 10 Ohm cm, 1000 nm SiO2