APPLICATION NOTES

Here you can download further application notes on various topics. If you have any further technical questions, please do not hesitate to contact our support team.

> Technical support

Our book "Photolithography - Fundamentals of Microstructuring" is also a good guide. If you are not yet familiar with it, you can order it from us free of charge.

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WAFER
Production of Silicon Ingots
Silicon Wafers: Production and Specification
Oxidation and Coating of Silicon Wafers
Silicon Crystallography
Quartz Wafers: Crystallography, Production and Specification
Fused Silica Wafers: Production and Specification
Borosilicate Glass Wafers: Production and Specification

LITHOGRAPHY
Wet Etching: Basics
Wet Etching of Al, Au, Cu, Cr, Ni, Ti and Ag
Wet Etching of Silicon
Dry Etching and RIE
Lift-off Processes
Ion Implantation
Electro-plating: Basics
Electro-plating of Au, Cu, Ni and Ag
Organic Solvents: Theory and Application
Lithography Trouble-Shooter

PHOTORESIST PROCESSING
Composition and Properties of Photoresists
Storage, Ageing and Handling of Photoresists
Selection Criteria of Photoresists
Substrate Pretreatment: Cleaning and Adhesion Promotion
Spin-coating
Spray-coating
Dip-coating
Softbake
Rehydration
Optical Parameters of Photoresists
Anti-Reflective-Coatings: TARC and BARC
Exposure of Photoresists
Post Exposure Bake
Development of Photoresist
Hardbake, Reflow und DUV-Hardening
Removal of Photoresist
Image Reversal Resist Processing
Negative Resist Processing

APPLICATION NOTES

WAFER

LITHOGRAPHY

PHOTORESIST PROCESSING